Samsung Electronics is accelerating research and development of its 1.4-nanometer (SF1.4) process node and is expanding cooperation with key semiconductor equipment suppliers.
According to Jin10, South Korean media outlet The Bell reported on June 26 (local time) that Samsung has resumed faster development work on the SF1.4 node. The process had previously been planned for mass production in 2027, but the timeline was delayed to 2029 after a shift in priorities within Samsung’s foundry business.
The report said Samsung recently shared its SF1.4 process plans with major equipment makers including Applied Materials and Lam Research, aiming to strengthen coordination across the supply chain and speed development of an equipment lineup best suited to the node. This includes customized versions of standard tools.
The report also said Samsung has brought in ASML’s High NA EUV lithography patterning equipment, which has been installed at the NRD-K semiconductor R&D complex. For Samsung, the High NA EUV tool is expected to be used in production as early as the SF1.4 node.